Directed Self-Assembly skill for block copolymer lithography and nanoparticle templating
Controls directed self-assembly processes for block copolymer lithography and nanoparticle templating.
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The DSA Process Controller skill provides directed self-assembly process control for block copolymer lithography and nanoparticle templating, enabling sub-lithographic patterning through controlled polymer phase separation.
BCP Selection
Annealing Optimization
Defect Analysis
{
"bcp_system": "string (e.g., PS-b-PMMA)",
"target_pitch": "number (nm)",
"morphology": "lamellar|cylindrical|spherical",
"guiding_type": "graphoepitaxy|chemoepitaxy",
"substrate_pattern": "string"
}
{
"annealing_protocol": {
"method": "thermal|svA",
"temperature": "number (C)",
"time": "number (hours)",
"solvent": "string (optional)"
},
"achieved_pitch": "number (nm)",
"defect_density": "number (defects/um2)",
"correlation_length": "number (nm)",
"pattern_quality": "string"
}
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